氮化硅片|氮化硅晶圓|Silicon Nitride Wafers|SiN Wafers
國(guó)際品牌、品質(zhì)保障！
產(chǎn)品概述
英創(chuàng)力科技可以為客戶提供高質(zhì)量的氮化硅硅片，包括：LPCVD類氮化硅片：化學(xué)計(jì)量LPCVD氮化硅片、低應(yīng)力LPCVD氮化硅片以及超低應(yīng)力LPCVD氮化硅片；PECVD氮化硅片：PECVD氮化硅片、低應(yīng)力PECVD氮化硅片、PECVD氧化氮硅片。可供貨晶圓直徑從50mm~200mm，氮化硅層厚度為100?至20,000?。
最小訂貨量(MOQ)為25片
Innotronix offers a variety of film?processing options for your silicon needs.? This includes LPCVD nitride, and Innotronix can provide wafers with stoichiometric LPCVD nitride or low stress LPCVD nitride, as well as super low stress LPCVD nitride. We also offer high quality PECVD nitride, Low stress PECVD nitride, and PECVD OxyNitride. Wafer diameter is available from 2″ to 200mm and nitride?thickness is available from 100? to 20,000?.
Any amount of quantity can be ordered with a minimum batch order of 25 wafers.
合作廠商
Work With Global Leading manufacturers
規(guī)格表
Types of LPCVD Nitride
1.?Stoichiometric LPCVD nitride
Film thickness: 100? – 4500? on both sides
Film stress: =>800±50 MPa Tensile Stress
2.?Low stress LPCVD nitride
Film thickness: 100? – 20,000? on both sides
Film stress: <250±50 MPa Tensile Stress
3. Super low stress LPCVD nitride
Film thickness: 100? – 20,000? on both sides
Film stress: <100±50 MPa Tensile Stress
Types of?PECVD Nitride
1.?PECVD nitride
Film thickness: 100? – 5000? on?one side
Film stress: +400±50 MPa Tensile Stress
2.?Low stress?PECVD nitride
Film thickness: 100? – 20,000? on?one side
Film stress: <250±50 MPa Tensile Stress
3.?PECVD OxyNitride
Film thickness: 100? – 20,000? on?one side
Film stress: -400±50 MPa Tensile Stress
可根據(jù)客戶要求，定制單拋、雙拋，PECVD、LPCVD、化學(xué)計(jì)量 LPCVD等多種氮化硅襯底片。
我們的優(yōu)勢(shì)
- 廣泛的國(guó)際化貨源渠道
- 靈活的訂貨數(shù)量
- 深入的增值服務(wù):減薄、外延、劃片
應(yīng)用領(lǐng)域
- 傳感器
- 光電子器件
- ?
- ?
- ?
- ?
- ?
- ?
在線詢價(jià)
電話&郵件詢價(jià)
聯(lián)系電話：18600564919
郵件：sales##innotronix.com.cn (用@替代##即可)